23 Jul Multilayer negative photoresist mold manufacturing method
Abstract
The invention relates to a multilayer negative photoresist mold manufacturing method, and belongs to the field of micromachining process technology research. The invention relates to a manufacturing method of a multilayer SU-8 mold. The mold is applied in the fields of microelectromechanical system, tissue engineering, biomechanics, and the like. The manufacturing method comprises the steps that: a positive photoresist is adopted as a sacrificial layer; a temporary substrate is constructed on lower-layer SU-8 photoresist; when explosion of former two layers of SU-8 photoresist is completed, development is simultaneously carried out; the image area after development is filled by using the positive photoresist; the material is dried on a hot plate, until the filled photoresist is completely cured; excessive photoresist is removed with a wet grinding polishing technology; and the flatness of the entire photoresist layer is trimmed. According to the invention, the positive photoresist is adopted as a sacrificial layer, such that additional sacrificial layer removing process is not needed, and manufacturing difficulty of the multilayer negative photoresist mold is substantially reduced. The manufacturing process provided by the invention is simple, and is compatible with existing micromachining processes. The method has high practicality.
Year: 2013
Country: CN
Doc No: 103353708